News
January, 2010
EHDTG demonstrates additional PECVD precursor vaporization capabilities
EHD Technology Group has now added metal precursors to the growing list of PECVD precursor liquids that have been sprayed with EHD. This process creates uniquely small droplets that evaporate with less heat, thus avoiding heat-related material degradation. Liquid precursors that have been successfully demonstrated include high-k (TEMAHf), low-k (TOMCATS, OMCTS, DMDMOS), and metal (titanium, ruthenium, tungsten) film precursors.
November, 2009
EHDTG achieves new milestones in particle removal
EHD Technology Group announces that its patented EHD particle removal system has achieved greater than 95% particle removal efficiency (PRE). Ongoing demonstrations are being performed on the company's atmospheric chamber, using an EHD nozzle design that includes nanodroplet generation and a gas sheath.
April, 2009
EHDTG announces chambers operating at atmospheric pressure
EHD Technology Group announces the successful startup of newly designed chambers that operate EHD nozzles within a controlled atmospheric pressure environment. The company is demonstrating particle removal from 200mm and 300mm semiconductor wafers. Development work performed in the new chambers will easily integrate into established wafer cleaning tools.
March, 2009
EHDTG announces 300mm demonstration system
EHD Technology Group announces that new systems have been installed that are able to perform EHD demonstrations on 300mm wafers. As the industry moves to larger wafers with smaller feature sizes, the cleaning and removal challenges grow. The new system includes wafer handling for 200mm and 300mm wafers, as well as for smaller coupons of arbitray size and geometry.
November, 2008
EHD concepts and applications highlighted at industry event
EHD Technology Group presents a poster at the biannual Ultra Clean Processing of Semiconductor Surfaces (UCPSS) Conference.
November, 2007
Funding for advancing EHD particle removal applications
EHD Technology Group announces that it has been awarded a $2 M Advanced Technology Program grant from the National Institute of Standards and Technology.